New Ultra-Clean sapphire wafers achieve breakthrough in surface quality
Synthetic sapphire firm Monocrystal has released a new range of ‘Ultra-Clean’ sapphire wafers, which it says achieve a breakthrough in wafer surface quality required by high-precision optoelectronic applications such as microLEDs.
A microLED is the next generation light source, that has advantages over a conventional LED in terms of brightness and power consumption.
Monocrystal’s Ultra-Clean (UC) sapphire wafers have only 20-50 particles of no more than 1 micron in size on their surface; they are specially designed for microLED production.
“MicroLED is a very promising technology which requires a new approach in many aspects, including sapphire wafer surface preparation. Our UC-wafers with a very low particle count will allow our customers to achieve their target epitaxial yields, which is crucial for microLED successful development and further commercialisation,” Monocrystal’s CEO Oleg Kachalov commented.
“Our new UC-wafers are also compatible with the conventional PSS process. It is an advanced cost-saving solution, which eliminates the pre-cleaning step and allows PSS-makers to increase their yields up to 95-99 percent after the first pass. We have already received a very positive feedback on the UC-wafers from several long-term customers. We are encouraged to further develop our sapphire processing and cleaning technologies to assist our customers in achieving competitive advantages on the market,” added Monocrystal’s VP sales Mikhail Berest.
